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Condition: Seller refurbished Location: Morgan Hill, United States GaAs, InP wafer Strip and Descum. The Model 205 provides high throughput in a single wafer system capable of handling wide variety of substrates, including ... moreround or square, and ranging from 50mm up to 150mm.
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Condition: Seller refurbished Location: Morgan Hill, United States An Advanced Rapid Thermal Processing System with Multi-Gas Capabilities. Dual-Arm Robot Transport. C from set point. This feature greatly simplifies programming ... morecomplex multi-step cycles, since no “tweaking” of system variables is required.
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Condition: Seller refurbished Location: Morgan Hill, United States GaAs, InP wafer Strip and Descum. • Enhanced gate oxide integrity. The Model 105 provides high throughput in a single wafer system capable of handling ... morewide variety of substrates, including round or square, and ranging from 50mm up to 150mm.
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Condition: Used Location: China Category : PECVD. AMP-3300 Plasma II PECVD Deposition System. Ambient Air Relative Humidity: 40% or less. Water Resistivity: Must be greater than 20,000 ... moreohms cm. Water Temperature: Maximum inlet temperature: 77F (25C), Minimum 68F (20C).
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Condition: Used Location: China The cycle repeats. Each of the models in the 90Xe family have been optimized for specific etches of specific films. Gas Lines: 4. Condition : Complete, ... moreworking condition. The system was de-installed from a Fab in USA in July, 2016.
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Condition: Used Location: China The Branson/IPC 3100 Plasma Systems generate a low pressure, low temperature gaseous plasma. Two seperate units are provided which are interconnected ... moreby gas hoses and electrical cables. These are the RF GENERATOR and the REACTOR CENTER.
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